Electrostatic capacitance detecting device

ABSTRACT

The invention provides an electrostatic capacitance detection device. The electrostatic capacitance detection device can be formed of M individual power supply lines, N individual output lines, arranged in a matrix of M rows×N columns, and electrostatic capacitance detection elements provided on the crossing points of the individual power supply lines and the individual output lines, each of the electrostatic capacitance detection elements is formed of a signal detection element and a signal amplification element, the signal detection element is formed of a capacitance detecting electrode and a capacitance detecting dielectric layer, the signal amplification element formed of a metal-insulator-semiconductor (MIS) type thin film semiconductor device for signal amplification, including a gate electrode, a gate insulating layer and a semiconductor layer.

BACKGROUND OF THE INVENTION

This is a Divisional of application Ser. No. 10/825,377 filed Apr. 16,2004. The entire disclosure of the prior application is herebyincorporated by reference herein in its entirety.

1. Field of Invention

The present invention relates to an electrostatic capacitance detectiondevice, which reads surface contours of an object having a fineindentation, such as a fingerprint, by detecting an electrostaticcapacitance, which changes according to the distance from the surface ofthe object.

2. Description of Related Art

Conventionally, an electrostatic capacitance detection device used forfingerprint sensor or the like is formed of a sensor electrode and adielectric layer, provided on the sensor electrode, on a single crystalsilicon substrate. See, for example, Japanese laid-open patentpublication No. 11-118415, No. 12-346608, No. 13-56204 and No.13-133213). FIG. 1 shows an operating principle of the conventionalelectrostatic capacitance detection device. A sensor electrode and adielectric layer form an electrode and a dielectric layer of acapacitor, and a human body becomes the other electrode, which isgrounded. The electrostatic capacitance C_(F) of this capacitor changesdepending on the indentation of a fingerprint contacting the surface ofthe dielectric layer. A capacitor having the electrostatic capacitanceC_(S) is prepared on the semiconductor substrate, and the two capacitorsare coupled in series and a predetermined voltage is applied thereon.This allows an electric charge Q to be generated between the twocapacitors depending on the indentation of the fingerprint. The electriccharge Q can be detected using a usual semiconductor technology, andsurface contours of the object can be read.

SUMMARY OF THE INVENTION

However, because the conventional electrostatic capacitance detectiondevices are formed on a single crystal silicon substrate, there has beena problem that the devices are cracked when a finger is strongly pressedthereon when used for a fingerprint sensor. Furthermore, the fingerprintsensor inevitably requires a size of approximately 20 mm×20 mm for itsapplication, and most of the area of the electrostatic capacitancedetection device is dominated by a sensor electrode. The sensorelectrode is, of course, formed on the single crystal silicon substrate,however, most area of the single crystal silicon substrate (beneath thesensor electrode), which is produced by consuming large amount ofresources and labor, only plays a role of a supporting body. In otherwords, there has been a problem that the conventional electrostaticcapacitance detection devices are not only expensive, but also have alarge amount of waste and expense associated with their manufacture.

In addition, it is recently required strongly that a personalauthenticating function is provided on cards, such as credit card andcash card, to enhance safety of cards. However, there has been a problemthat the electrostatic capacitance detection devices manufactured on theconventional single crystal silicon substrate is not so flexible,therefore, the devices cannot be manufactured on a plastic substrate.

An object of the present invention is to provide an electrostaticcapacitance detection device, which can operate stably, reduceunnecessary energy and labor during manufacturing, and can bemanufactured on substrates other than the single crystal siliconsubstrate.

The invention is an electrostatic capacitance detection device forreading surface contours of an object by detecting an electrostaticcapacitance, which changes according to the distance from the object.The electrostatic capacitance detection device can be formed of Mindividual power supply lines and N individual output lines, arranged ina matrix of M rows×N columns, and electrostatic capacitance detectionelements provided on the crossing points of the individual power supplylines and the individual output lines. Each of the electrostaticcapacitance detection elements can be formed of a signal detectionelement and a signal amplification element, the signal detection elementis formed of a capacitance detecting electrode, a capacitance detectingdielectric layer and a reference capacitor. The reference capacitor canbe formed of a reference capacitor first electrode, a referencecapacitor dielectric layer and a reference capacitor second electrode.The sigal amplification element is formed of a MIS type thin filmsemiconductor device for signal amplification, including a gateelectrode, a gate insulating layer and a semiconductor layer.Furthermore, a drain region of the MIS type thin film semiconductordevice for signal amplification is connected to each of the individualpower supply lines and the reference capacitor first electrode, and agate electrode of the MIS type thin film semiconductor device for signalamplification is connected to the capacitance detecting electrode andthe reference capacitor second electrode. A source region of the MIStype thin film semiconductor device for signal amplification isconnected to the each of the individual output lines directly, orindirectly through a switching element. In the present invention, thedielectric layer of the reference capacitor and the gate insulatinglayer of the MIS type thin film semiconductor device for signalamplification are formed with a same material on a same layer.Furthermore, the reference capacitor first electrode and thesemiconductor layer drain region are formed with a same material on asame layer. Furthermore, the reference capacitor second electrode andthe gate electrode are formed with a same material on a same layer.

In the invention, using an area of the reference capacitor electrode ofS_(R) (μm²), a gate area of the MIS type thin film semiconductor devicefor signal amplification of S_(T) (μm²), a thickness of the referencecapacitor of t_(R) (μm), a dielectric constant of the referencecapacitor dielectric layer of ∈_(R), a thickness of the gate insulatinglayer of t_(ox) (μm), a dielectric constant of the gate insulating layerof ∈_(ox), the capacitance C_(R) of the reference capacitor and thetransistor capacitance of C_(T) of the MIS type thin film semiconductordevice for signal amplification are defined asC _(R)=∈₀·∈_(R) ·S _(R) /t _(R),C _(T)'∈₀·∈_(ox) ·S _(T) /t _(ox)

where ∈₀ is the permittivity in vacuum, respectively, and using an areaof the capacitance detecting electrode of S_(D) (μm²), a thickness ofthe capacitance detecting dielectric layer of t_(D) (μm), a dielectricconstant of the capacitance detecting dielectric layer of ∈_(D), theelement capacitance C_(D) of the signal detection element is defined asC _(D)=∈₀·∈_(D) ·S _(D) /t _(D)

where ∈₀ is the permittivity in vacuum, and the element capacitanceC_(D) is sufficiently larger than C_(R)+C_(T), a summation of thecapacitance C_(R) of the reference capacitor and the transistorcapacitance C_(T). Sufficiently large generally means a difference ofapproximately ten times or more, therefore, in other words, the elementcapacitance C_(D) satisfies a relation ofC _(D)>10×(C _(R) +C _(T)),

whereas C_(R)+C_(T) is a summation of the capacitance C_(R) of thereference capacitor and the transistor capacitance C_(T). In theelectrostatic capacitance detection device according to the presentinvention, the capacitance detecting dielectric layer is preferablylocated on the uppermost surface of the electrostatic capacitancedetection device. When the object is apart from the capacitancedetecting dielectric layer with an object distance of t_(A) withoutcontacting the capacitance detecting dielectric layer, the capacitanceC_(A) of the object is defined asC _(A)=∈₀ ·∈ _(A) ·S _(D) /t _(A)

using the permittivity in vacuum of ∈₀, a dielectric constant of air of∈_(A), and an area of the capacitance detecting electrode of S_(D), thenthe electrostatic capacitance detection device is configured so thatC_(R)+C_(T), a summation of the capacitance C_(R) of the referencecapacitor and the transistor capacitance C_(T), is sufficiently largerthan the capacitance C_(A) of the object. As described above, if adifference of approximately ten times or more is recognized, it meanssufficiently large, therefore, C_(R)+C_(T), a summation of thecapacitance C_(R) of the reference capacitor and the transistorcapacitance C_(T), and the capacitance C_(A) of the object satisfy arelation of(C _(R) +C _(T))>10×C _(A).

More ideally, the capacitance detecting dielectric layer is located onthe uppermost surface of the electrostatic capacitance detection device,and using an area of the reference capacitor electrode of S_(R) (μm²), agate area of the MIS type thin film semiconductor device for signalamplification of S_(T) (μm²), a thickness of the reference capacitor oft_(R) (μm), a dielectric constant of the reference capacitor dielectriclayer of ∈_(R), a thickness of the gate insulating layer of t_(ox) (μm),a dielectric constant of the gate insulating layer of ∈_(ox), thecapacitance C_(R) of the reference capacitor and the transistorcapacitance of C_(T) of the MIS type thin film semiconductor device forsignal amplification are defined asC _(R)=∈₀·∈_(R) ·S _(R) /t _(R),C _(T)=∈₀·∈_(ox) ·S _(T) /t _(ox)

where ∈₀ is the permittivity in vacuum, respectively, and using an areaof the capacitance detecting electrode of S_(D) (μm²), a thickness ofthe capacitance detecting dielectric layer of t_(D) (μm), a dielectricconstant of the capacitance detecting dielectric layer of ∈_(D), theelement capacitance C_(D) of the signal detection element is defined asC _(D)=∈₀·∈_(D) ·S _(D)/t_(D)

where ∈₀ is the permittivity in vacuum, and the element capacitanceC_(D) is sufficiently larger than C_(R)+C_(T), a summation of thecapacitance C_(R) of the reference capacitor and the transistorcapacitance C_(T), and when the object is apart from the capacitancedetecting dielectric layer with an object distance of t_(A) withoutcontacting the capacitance detecting dielectric layer, the capacitanceC_(A) of the object is defined asC _(A)=∈₀·∈_(A) ·S _(D) /t _(A)

using the permittivity in vacuum of ∈₀, a dielectric constant of air of∈_(A), and an area of the capacitance detecting electrode of S_(D), thenthe electrostatic capacitance detection device is configured so thatC_(R)+C_(T), a summation of the capacitance C_(R) of the referencecapacitor and the transistor capacitance C_(T), is sufficiently largerthan the capacitance C_(A) of the object. More specifically, theelectrostatic capacitance detection device is configured so that theelement capacitance C_(D), C_(R)+C_(T), a summation of the capacitanceC_(R) of the reference capacitor and the transistor capacitance C_(T),and the capacitance C_(A) of the object satisfy a relation ofC _(D)>10×(C _(R) +C _(T))>100×C _(A).

The invention is an electrostatic capacitance detection device forreading surface contours of an object by detecting an electrostaticcapacitance, which changes according to the distance from the object,wherein the electrostatic capacitance detection device is formed of Mindividual power supply lines and N individual output lines, arranged ina matrix of M rows×N columns, and electrostatic capacitance detectionelements provided on the crossing points of the individual power supplylines and the individual output lines. Each of the electrostaticcapacitance detection elements can be formed of a signal detectionelement and a signal amplification element. The signal detection elementis formed of a capacitance detecting electrode, a capacitance detectingdielectric layer and a reference capacitor, the reference capacitor isformed of a reference capacitor first electrode, a reference capacitordielectric layer and a reference capacitor second electrode, the signalamplification element is formed of a MIS type thin film semiconductordevice for signal amplification, including a gate electrode, a gateinsulating layer and a semiconductor layer, and a part of the drainregion and a part of the gate electrode of the MIS type thin filmsemiconductor device for signal amplification form an overlapped portionvia a gate insulating layer, and the overlapped portion forms areference capacitor. Specifically, the drain region side ofsemiconductor layer including a donor type or acceptor type impurity inthe semiconductor layer forming a MIS type thin film semiconductordevice for signal amplification becomes a reference capacitor firstelectrode, which is directly or indirectly coupled with the individualpower supply lines. The gate electrode of the MIS type thin filmsemiconductor device for signal amplification is a common electrode withthe reference capacitor second electrode, and coupled to the capacitancedetecting electrode. The source region of the MIS type thin filmsemiconductor device for signal amplification is directly or indirectlycoupled to the individual output lines.

In the invention, using a gate electrode length, which is an overlappedportion of the gate electrode of the MIS type thin film semiconductordevice for signal amplification and the semiconductor layer drainregion, L₁ (μm), a gate electrode length, which is an overlapped portionof the gate electrode of the MIS type thin film semiconductor device forsignal amplification and the semiconductor layer channel forming region,L₂ (μm), a width of the gate electrode of W (μm), a thickness of thegate insulating layer of t_(ox) (μm), a dielectric constant of the gateinsulating layer of ∈_(ox), the capacitance C_(R) of the referencecapacitor and the transistor capacitance of C_(T) of the MIS type thinfilm semiconductor device for signal amplification are defined asC _(R)=∈₀·∈_(ox) ·L ₁ ·W/t _(ox),C _(T)=∈₀·∈_(ox) ·L ₂ ·W/t _(ox)

where ∈₀ is the permittivity in vacuum, respectively, and using an areaof the capacitance detecting electrode of S_(D) (μm²), a thickness ofthe capacitance detecting dielectric layer of t_(D) (μm), a dielectricconstant of the capacitance detecting dielectric layer of ∈_(D), theelement capacitance C_(D) of the signal detection element is defined asC _(D)=∈₀·∈_(D) ·S _(D) /t _(D)

where ε₀ is the permittivity in vacuum, and the element capacitanceC_(D) is sufficiently larger than C_(R)+C_(T), a summation of thecapacitance C_(R) of the reference capacitor and the transistorcapacitance C_(T). Sufficiently large generally means a difference ofapproximately ten times or more, therefore, in other words, the elementcapacitance C_(D) satisfies a relation ofC _(D)>10×(C _(R) +C _(T)),

whereas C_(R)+C_(T) is a summation of the capacitance C_(R) of thereference capacitor and the transistor capacitance C_(T). In theelectrostatic capacitance detection device according to the invention,the capacitance detecting dielectric layer is preferably located on theuppermost surface of the electrostatic capacitance detection device.When the object is apart from the capacitance detecting dielectric layerwith an object distance of t_(A) without contacting the capacitancedetecting dielectric layer, the capacitance C_(A) of the object isdefined asC _(A)=∈₀·∈_(A) ·S _(D) /t _(A)

using the permittivity in vacuum of ∈₀, a dielectric constant of air of∈_(A), and an area of the capacitance detecting electrode of S_(D), thenthe electrostatic capacitance detection device is configured so thatC_(R)+C_(T), a summation of the capacitance C_(R) of the referencecapacitor and the transistor capacitance C_(T), is sufficiently largerthan the capacitance C_(A) of the object. As described above, if adifference of approximately ten times or more is recognized, it can meansufficiently large, therefore, C_(R)+C_(T), a summation of thecapacitance C_(R) of the reference capacitor and the transistorcapacitance C_(T), and the capacitance C_(A) of the object satisfy arelation of(C _(R) +C _(T))>10×C _(A).

More ideally, the capacitance detecting dielectric layer is located onthe uppermost surface of the electrostatic capacitance detection device,and using a gate electrode length, which is an overlapped portion of thegate electrode of the MIS type thin film semiconductor device for signalamplification and the semiconductor layer drain region, L₁ (μm), a gateelectrode length, which is an overlapped portion of the gate electrodeof the MIS type thin film semiconductor device for signal amplificationand the semiconductor layer channel forming region, L₂ (μm), a width ofthe gate electrode of W (μm), a thickness of the gate insulating layerof t_(ox) (μm), a dielectric constant of the gate insulating layer of∈_(ox), the capacitance C_(R) of the reference capacitor and thetransistor capacitance of C_(T) are defined asC _(R)=∈₀·∈_(ox) ·L ₁ ·W/t _(ox)C _(T)=∈₀·∈_(D) ·L ₂ ·W/t _(ox)

where ∈₀ is the permittivity in vacuum, respectively, and using an areaof the capacitance detecting electrode of S_(D) (μm²), a thickness ofthe capacitance detecting dielectric layer of t_(D) (μm), a dielectricconstant of the capacitance detecting dielectric layer of ∈_(D), theelement capacitance C_(D) of the signal detection element is defined asC _(D)=∈₀·∈_(D) ·S _(D)/t_(D)

where ∈₀ is the permittivity in vacuum, and the element capacitanceC_(D) is sufficiently larger than C_(R)+C_(T), a summation of thecapacitance C_(R) of the reference capacitor and the transistorcapacitance C_(T), and when the object is apart from the capacitancedetecting dielectric layer with an object distance of t_(A) withoutcontacting the capacitance detecting dielectric layer, the capacitanceC_(A) of the object is defined asC _(A)=∈₀·∈_(D) ·S _(D)/t_(A)

using the permittivity in vacuum of ∈₀, a dielectric constant of air of∈_(A), and an area of the capacitance detecting electrode of S_(D), thenthe electrostatic capacitance detection device is configured so thatC_(R)+C_(T), a summation of the capacitance C_(R) of the referencecapacitor and the transistor capacitance C_(T), is sufficiently largerthan the capacitance C_(A) of the object. More specifically, theelectrostatic capacitance detection device is configured so that theelement capacitance C_(D), C_(R)+C_(T), a summation of the capacitanceC_(R) of the reference capacitor and the transistor capacitance C_(T),and the capacitance C_(A) of the object satisfy a relation ofC _(D)>10×(C _(R) +C _(T))>100×C _(A).

The invention is an electrostatic capacitance detection device forreading surface contours of an object by detecting an electrostaticcapacitance, which changes according to the distance from the object.The electrostatic capacitance detection device is formed of M individualpower supply lines and N individual output lines, arranged in a matrixof M rows×N columns, electrostatic capacitance detection elementsprovided on the crossing points of the individual power supply lines andthe individual output lines, and furthermore, a power supply selectingcircuit coupled to the M individual power supply lines. Each of theelectrostatic capacitance detection elements can be formed of acapacitance detecting electrode, a capacitance detecting dielectriclayer, a reference capacitor and a signal amplification element, thereference capacitor is formed of a reference capacitor first electrode,a reference capacitor dielectric layer and a reference capacitor secondelectrode, the signal amplification element is formed of a MIS type thinfilm semiconductor device for signal amplification, including a gateelectrode, a gate insulating layer and a semiconductor layer. In thiscase, a source region of the MIS type thin film semiconductor device forsignal amplification element is directly or indirectly coupled to eachof the individual output lines, a drain region of the MIS type thin filmsemiconductor device for signal amplification element is connected toeach of the individual power supply lines and the reference capacitorfirst electrode, and a gate electrode of the MIS type thin filmsemiconductor device for signal amplification element is connected tothe capacitance detecting electrode and the reference capacitor secondelectrode. In the electrostatic capacitance detection device accordingto the invention, the individual output lines are wired by the firstwiring, the individual power supply lines are wired by the secondwiring, the capacitance detecting electrode is wired by the thirdwiring, and the first, second, and third wirings are electricallyinsulated via the insulating layers.

The invention is an electrostatic capacitance detection device forreading surface contours of an object by detecting an electrostaticcapacitance, which changes according to the distance from the object.The electrostatic capacitance detection device is formed of M individualpower supply lines and N individual output lines, arranged in a matrixof M rows×N columns, electrostatic capacitance detection elementsprovided on the crossing points of the individual power supply lines andthe individual output lines, and furthermore, an output signal selectingcircuit coupled to the N individual output lines. Each of theelectrostatic capacitance detection elements is formed of a capacitancedetecting electrode, a capacitance detecting dielectric layer, areference capacitor and a signal amplification element, the outputsignal selecting circuit is formed of a common output line and a pathgate for output signal, the reference capacitor is formed of a referencecapacitor first electrode, a reference capacitor dielectric layer and areference capacitor second electrode, the signal amplification elementis formed of a MIS type thin film semiconductor device for signalamplification, including a gate electrode, a gate insulating layer and asemiconductor layer, the path gate for output signal is formed of a MIStype thin film semiconductor device for output signal path gate,including a gate electrode, a gate insulating layer and a semiconductorlayer.

In this case, a source region of the MIS type thin film semiconductordevice for signal amplification element is directly or indirectlycoupled to each of the individual output lines, a drain region of theMIS type thin film semiconductor device for signal amplification elementis connected to each of the individual power supply lines and thereference capacitor first electrode, a gate electrode of the MIS typethin film semiconductor device for signal amplification element isconnected to the capacitance detecting electrode and the referencecapacitor second electrode, a source region of the MIS type thin filmsemiconductor device for output signal path gate is connected to thecommon output line, and a drain region of the MIS type thin filmsemiconductor device for output signal path gate is also coupled to eachof the individual output line. Furthermore, a gate electrode of the MIStype thin film semiconductor device for output signal path gate isconnected to an output line for output selection, which supplies asignal for selecting what individual output line is selected among Nindividual output lines. In the electrostatic capacitance detectiondevice according to the present invention, the individual output linesand the common output line are wired by the first wiring, the individualpower supply lines and the output line for output selection are wired bythe second wiring, the capacitance detecting electrode is wired by thethird wiring, and the first, second, and third wirings are electricallyinsulated via the insulating layers.

The invention is an electrostatic capacitance detection device forreading surface contours of an object by detecting an electrostaticcapacitance, which changes according to the distance from the object.The electrostatic capacitance detection device can be formed of Mindividual power supply lines and N individual output lines, arranged ina matrix of M rows×N columns, electrostatic capacitance detectionelements provided on the crossing points of the individual power supplylines and the individual output lines, and furthermore, a power supplyselecting circuit coupled to the M individual power supply lines, and anoutput signal selecting circuit coupled to the N individual outputlines. Each of the electrostatic capacitance detection elements isformed of a capacitance detecting electrode, a capacitance detectingdielectric layer, a reference capacitor and a signal amplificationelement, the output signal selecting circuit is formed of a commonoutput line and a path gate for output signal, the reference capacitoris formed of a reference capacitor first electrode, a referencecapacitor dielectric layer and a reference capacitor second electrode,the signal amplification element is formed of a MIS type thin filmsemiconductor device for signal amplification, including a gateelectrode, a gate insulating layer and a semiconductor layer, the pathgate for output signal is formed of a MIS type thin film semiconductordevice for output signal path gate, including a gate electrode, a gateinsulating layer and a semiconductor layer.

In this case, a source region of the MIS type thin film semiconductordevice for signal amplification element is directly or indirectlycoupled to each of the individual output lines, a drain region of theMIS type thin film semiconductor device for signal amplification elementis connected to each of the individual power supply lines and thereference capacitor first electrode, a gate electrode of the MIS typethin film semiconductor device for signal amplification element isconnected to the capacitance detecting electrode and the referencecapacitor second electrode, a source region of the MIS type thin filmsemiconductor device for output signal path gate is connected to thecommon output line, and a drain region of the MIS type thin filmsemiconductor device for output signal path gate is connected to each ofthe individual output lines. Furthermore, a gate electrode of the MIStype thin film semiconductor device for output signal path gate isconnected to an output line for output selection, which supplies asignal for selecting what individual output line is selected among Nindividual output lines. In the electrostatic capacitance detectiondevice according to the invention, the individual output lines and thecommon output line are wired by the first wiring, the individual powersupply lines and the output line for output selection are wired by thesecond wiring, the capacitance detecting electrode is wired by the thirdwiring, and the first, second, and third wirings are electricallyinsulated via the insulating layers.

A conventional technology using a single crystal silicon substrate(single crystal silicon sensor) can only form a small electrostaticcapacitance detection device in a square shape of approximately having afew millimeter in each side on a plastic substrate, however, anelectrostatic capacitance detection device having the same performanceas the conventional single crystal silicon sensor can be realized with athin film semiconductor device according to the present invention.Furthermore, a sensor area of the electrostatic capacitance detectiondevice can be also increased to approximately 100 times easily, andadditionally, this excellent electrostatic capacitance detection devicecan be formed on a plastic substrate. In addition, the indentationinformation of an object can be detected with significant highprecision. As a result, when this electrostatic capacitance detectiondevice is mounted, for example, on a smart card, an effect of remarkablyenhanced security level for the card can be recognized. Furthermore, theconventional electrostatic capacitance detection device, using thesingle crystal silicon substrate, utilizes only a part of theelectrostatic capacitance detection device for the single crystalsilicon semiconductor, resulting in spending a lot energy and labor inwaste. On the other hand, the invention eliminates the above describedwaste, and has an effect that is useful in preserving the globalenvironment.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention will be described with reference to the accompanyingdrawings, wherein like numerals reference like elements, and wherein:

FIG. 1 is a diagram explaining an operating principle in theconventional art;

FIG. 2 is a diagram explaining an operating principle in the presentinvention;

FIG. 3 is a diagram explaining an operating principle in the presentinvention;

FIG. 4A is a diagram explaining an element structure according to thepresent invention;

FIG. 4B is a diagram explaining an element structure according to thepresent invention;

FIG. 5 is a diagram explaining a principle of the present invention;

FIG. 6 is a diagram explaining an overall configuration of the presentinvention;

FIG. 7 is a diagram explaining a clock generator circuit of the presentinvention;

FIG. 8 is a diagram explaining a power supply selecting circuitconfiguration of the present invention

FIG. 9 is a diagram explaining an output signal selecting circuitconfiguration of the present invention;

FIG. 10 is a diagram explaining an information obtaining part circuitconfiguration of the present invention; and

FIG. 11 is a transfer characteristic diagram of a thin filmsemiconductor device used in the embodiment.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

The invention manufactures an electrostatic capacitance detection devicefor reading surface contours of an object by detecting an electrostaticcapacitance, which changes according to the distance with the objectwith a metal-insulator-semiconductor (MIS) type thin film semiconductor.Because the thin film semiconductor device is usually manufactured on aglass substrate, it is known as a technology, which inexpensivelymanufactures semiconductor integrated circuits requiring a large areaand is specifically applied to liquid crystal display devices.Therefore, when the electrostatic capacitance detection device, which isapplied to a finger print sensor or the like, is manufactured by thethin film semiconductor device, it is unnecessary to use an expensivesubstrate, such as a single crystal silicon substrate, which ismanufactured by consuming large amount of energy, thereby capable ofinexpensively manufacturing the device without consuming preciousresources on the earth. Furthermore, as for the thin film semiconductordevice, a semiconductor integrated circuit can be manufactured on aplastic substrate by using a transfer technology called as the SUFTLA(Japanese laid-open patent publication No. 11-312811 or S. Utsunomiyaet. al. Society for Information Display p. 916 (2000)), therefore, theelectrostatic capacitance detection device can be formed on the plasticsubstrate without using the single crystal silicon substrate.

A current technology for the thin film semiconductor device cannotmanufacture the electrostatic capacitance detection device applying theconventional operating principle shown in FIG. 1. Because an electriccharge Q induced between the two capacitors coupled in series is sosmall, the electric charge Q can be accurately read by using a singlecrystal silicon LSI technology, which allows a high precision detection,however, the transistor characteristic of the thin film semiconductordevice is not so excellent as that of the single crystal silicon LSItechnology and the characteristic deviation among thin filmsemiconductor devices is so large, therefore, the electric charge Qcannot be accurately read. Thus, the electrostatic capacitance detectiondevice according to the invention is formed of M (M is an integer of oneor more) individual power supply lines and N (N is an integer of one ormore) individual output lines, arranged in a matrix of M rows×N columns,and electrostatic capacitance detection elements provided on thecrossing points of the individual power supply lines and the individualoutput lines, wherein each of the electrostatic capacitance detectionelements is formed of a signal detection element and a signalamplification element. The signal detection element can be formed of acapacitance detecting electrode, a capacitance detecting dielectriclayer and a reference capacitor, and the electric charge Q is generatedon the capacitance detecting electrode depending on the electrostaticcapacitance. In the present invention, the electric charge Q isamplified and converted into current by the signal amplification elementprovided on each of the electrostatic capacitance detection elements.Specifically, the signal amplification element is formed of a MIS typethin film semiconductor device for signal amplification, including agate electrode, a gate insulating layer and a semiconductor layer,wherein the gate electrode of the MIS type thin film semiconductordevice for signal amplification is connected to the capacitancedetecting electrode and either one of the electrodes of the referencecapacitor (for example, the second electrode).

FIG. 2 shows an operating principle of the invention. Electric charges,which are generated between a capacitor having the electrostaticcapacitance C_(S) and a capacitor having the electrostatic capacitanceC_(F) that changes depending on surface contours of the object, change agate voltage of the MIS type thin film semiconductor device for signalamplification. When a predetermined voltage is applied on the drainregion of the thin film semiconductor device, a current I, flowingbetween the source and drain of the thin film semiconductor device, issignificantly amplified depending on the induced electric charges Q. Theinduced electric charges Q are preserved without flowing to anywhere,therefore, the current I can be easily measured by increasing the drainvoltage or extending the measuring time. Accordingly, the surface shapeof the object can be measured with sufficient accuracy even using thethin film semiconductor device.

As described above, in the invention, the MIS type thin filmsemiconductor device for signal amplification is used as the signalamplification element. In this case, the MIS type thin filmsemiconductor device for signal amplification is also used as acapacitor having the electrostatic capacitance C_(S), and furthermore, areference capacitor is provided to increase an electrostatic capacitanceand enhance detecting sensitivity. In other words, in place of theelectrostatic capacitance C_(S), a new electrostatic capacitance is tobe a summation of the transistor capacitance C_(T) of the MIS type thinfilm semiconductor device for signal amplification and the capacitanceC_(R) of the reference capacitor, which is for increasing anelectrostatic capacitance. This allows the adjustment of electriccapacitance, and furthermore, the simplification of the structure andthe manufacturing process. Furthermore, a high speed detecting operationcan be realized by reducing a length of the semiconductor channelforming region. In addition, it is effective to combine the two powersupply lines shown in FIG. 2 as a common power supply V_(dd), becausethe redundant wirings in the electrostatic capacitance detection devicecan be omitted. FIG. 3 shows an equivalent circuit diagram relating tothe operating principle in such a state. A capacitor having theelectrostatic capacitance C_(F) changing depending on surface contoursof the object and a capacitor having the transistor capacitance C_(T)are coupled in series, and at the same time, the capacitor having theelectrostatic capacitance C_(F) and a capacitor having the capacitanceC_(R) of the reference capacitor are coupled in series. Strictlyspeaking, the transistor capacitance C_(T) is the electrostaticcapacitance, formed between the drain electrode and the gate electrodeof the MIS type thin film semiconductor device for signal amplification.In order to realize the configuration shown in FIG. 3, the source regionof the MIS type thin film semiconductor device for signal amplificationis connected to each of the individual output lines, the drain region ofthe MIS type thin film semiconductor device for signal amplification isconnected to each of the individual power supply lines and the referencecapacitor first electrode, and furthermore, the gate electrode of theMIS type thin film semiconductor device for signal amplification and thereference capacitor second electrode are coupled, then a voltage V_(dd)is applied on the individual power supply lines and the current I,changing depending on the surface contours of the object, is outputtedfrom the individual output lines.

A structure of the electrostatic capacitance detection element realizingthe invention is described with reference to FIG. 4. As for the MIS typethin film semiconductor device for signal amplification forming a signalamplification element of the electrostatic capacitance detectionelement, the essential requirements are a semiconductor layer includinga source region, a channel forming region and a drain region, and a gateinsulating layer and a gate electrode. A donor type or acceptor typeimpurity is doped into the semiconductor layer in the source region andthe drain region, then an N type or P type semiconductor is formed. Thegate electrode overlaps over the semiconductor layer drain region viathe gate insulating layer, and a portion overlapped in this way becomesa reference capacitor. The reference capacitor is formed of a referencecapacitor first electrode, a reference capacitor dielectric layer, and areference capacitor second electrode.

As shown in FIG. 4(A), the first electrode becomes a common electrodewith the drain region as a lower electrode, and the second electrodebecomes a common electrode with the gate electrode as an upperelectrode, however, either the first electrode or the second electrodemay become the upper electrode. When a bottom gate type transistor, inwhich the gate electrode is located in a lower position with respect tothe semiconductor layer, is used as the MIS thin film semiconductordevice for signal amplification, the reference capacitor lower electrodebecomes a common electrode with the gate electrode, and the drain regionbecomes a common electrode with the reference capacitor upper electrode,thereby to simplify the structure. The reference capacitor firstelectrode and the semiconductor layer drain region are formed with asame layer (semiconductor layer in which a impurity is doped) on thesame layer (base protecting layer), and the reference capacitor secondelectrode and the gate electrode are also formed with a same layer(metallic layer) on a same layer (gate insulating layer). The gateelectrode of the MIS thin film semiconductor device for signalamplification is connected to the capacitance detecting electrode, whichis covered with a capacitance detecting dielectric layer. Thus, thesemiconductor layer drain region and the reference capacitor firstelectrode have a same potential, and the gate electrode of the MIS thinfilm semiconductor device for signal amplification and the referencecapacitor second electrode have a same potential and are coupled to thecapacitance detecting electrode, thereby realizing the equivalentcircuit shown in FIG. 3.

As for the configuration shown in FIG. 4(A), the reference capacitor andthe signal amplification element are arranged to be overlapped with eachother, thereby enhancing space-use efficiency, and realizing anelectrostatic capacitance detection device having high sensitivity.Furthermore, prior to forming the gate electrode, the referencecapacitor lower electrode and the drain region are formed, and afterforming the gate electrode, the source region is formed by theself-alignment method (the source region is formed by ion implantingusing the gate electrode as a mask), therefore, there is an effect thatthe channel forming region can be made smaller than the resolution levelthat a exposure device has. In general, the resolution of an exposuredevice is inferior to the alignment accuracy of the exposure device. Forthis reason, in the configuration of the invention, the channel formingregion length is formed using the alignment precision of the exposuredevice, not the resolution of the exposure device, therefore, the sizeof the channel forming region length can be fined to the level ofalignment precision, thereby realizing a high speed operation of theelectrostatic capacitance detecting circuit.

In FIG. 4(A), the MIS thin film semiconductor device for signalamplification is covered with a first interlayer insulating layer. Afirst wiring is connected to the source region of the MIS thin filmsemiconductor device for signal amplification, and a second wiring isconnected to the drain region of the MIS thin film semiconductor devicefor signal amplification. The individual output lines are formed by thefirst wiring and the individual power supply lines are formed by thesecond wiring. A second interlayer insulating layer is provided betweenthe first wiring and the second wiring, and electrically insulates thefirst wiring and the second wiring. The capacitance detecting electrode,forming the signal detection element of each of the electrostaticcapacitance detection elements, is connected to the gate electrode ofthe MIS thin film semiconductor device for signal amplification, andformed on a third interlayer insulating layer. The capacitance detectingelectrode is wired by the third wiring. Between the second wiring andthe third wiring, the third interlayer insulating layer is provided, andelectrically insulates the second wiring and the third wiring. Aparasitic capacitance, generated between the first wiring and thecapacitance detecting electrode, can be minimized by wiring thecapacitance detecting electrode with the third wiring, and a smallamount of electrostatic capacitance can be detected with highsensitivity by minimizing the dielectric constant of the secondinterlayer insulating layer and the dielectric constant of the thirdinterlayer insulating layer as much as possible. The capacitancedetecting dielectric layer covers on the capacitance detectingelectrode, and is located on the uppermost surface of the electrostaticcapacitance detection device. The capacitance detecting dielectric layeralso plays a role of protective layer for the electrostatic capacitancedetection device.

As for the example shown in FIG. 4(A), the overlapped portion of thegate electrode and the drain electrode of the signal amplificationelement is the reference capacitor, however, the reference capacitor andthe MIS thin layer transistor for amplifying signal may be separatedfrom each other, as shown in FIG. 4(B). The reference capacitor and thethin layer transistor for amplifying signal are coupled via a conductivematerial, such as a doped semiconductor layer. The transistor foramplifying signal is preferably as small as possible in order to operatewith a high speed. On the other hand, there exists an optimumcapacitance value for a summation of the capacitance C_(R) of thereference capacitor and the transistor capacitance C_(T) depending onthe to-be-detected object. As for the configuration shown in FIG. 4(B),the transistor can be made smaller, and at the same time the value ofC_(R)+C_(T) can be optimized, therefore, the sensitivity of theelectrostatic capacitance detection device according to the presentinvention can be enhanced. A portion for a contact hole, conducting theindividual power supply lines (second wiring) and the drain region, ispreferably provided between the reference capacitor and the MIS typethin layer transistor for amplifying signal.

As for the above configuration, in order that the MIS type thin filmsemiconductor device for signal amplification according to the inventioneffectively conduct a function of the signal amplification, thetransistor capacitance C_(T) of the MIS type thin film semiconductordevice for signal amplification, the capacitance C_(R) of the referencecapacitor, and the element capacitance C_(D) of the signal detectionelement have to be adequately determined. Next, a relation between thesewill be described with reference to FIG. 5.

At first, assume a situation that a protrusion portion of to-be-measuredobject contacts the capacitance detecting dielectric layer, and theobject is electrically grounded. Specifically, assume a situation thatthe electrostatic capacitance detection device is used as a finger printsensor, and a ridge of a fingerprint contact on the surface of thecapacitance detecting dielectric layer. By using an area of thereference capacitor electrode of S_(R) (μm²), a length of the referencecapacitor electrode of L_(R) (μm), a width of the reference capacitorelectrode of W_(R) (μm), an area of the gate electrode of S_(T) (μm²), alength of the gate electrode of L_(T) (μm), and a width of the gateelectrode of W_(T) (μm) of the MIS type thin film semiconductor devicefor signal amplification, a thickness of the reference capacitordielectric layer of t_(R) (μm), a dielectric constant of the referencecapacitor dielectric layer of ∈_(R), a thickness of the gate insulatinglayer of t_(ox) (μm), and a dielectric constant of the gate insulatinglayer of ∈_(ox), the capacitance C_(R) of the reference capacitor andthe transistor capacitance C_(T) of the MIS type thin film semiconductordevice for signal amplification are defined asC _(R)=∈₀·∈_(R) ·S _(R) /t _(R)=∈₀·∈_(R) ·L _(R) ·W _(R) /t _(R),C _(T)=∈₀·∈_(ox) ·S _(T) /t _(ox)=∈₀·∈_(ox) ·L _(T) ·W _(T) /t _(ox)

where ∈₀ is the permittivity in vacuum, respectively. When the referencecapacitor and the signal amplification element shown in FIG. 4(A) areintegrally formed, using a length of the gate electrode, which is anoverlapped portion of the gate electrode of the MIS type thin filmsemiconductor device for signal amplification and a drain region of thesemiconductor film, L₁ (μm), a length of the gate electrode, which is anoverlapped portion of the gate electrode of the MIS type thin filmsemiconductor device for signal amplification and a semiconductor layerchannel forming region, L₂ (μm), a width of the gate electrode of W(μm), a thickness of the gate insulating layer of t_(ox) (μm), adielectric constant of the gate insulating layer of ∈_(ox), thecapacitance C_(R) of the reference capacitor and the transistorcapacitance C_(T) of the MIS type thin film semiconductor device forsignal amplification are defined asC _(R)=∈₀·∈_(R) ·S _(R) /t _(R)=∈₀·∈_(ox) ·L ₁ ·W/t _(ox),C _(T)=∈₀·∈_(ox) ·S _(T) /t _(ox)=∈₀·∈_(ox) ·L ₂ ·W/t _(ox)

where ∈₀ is the permittivity in vacuum, respectively. Furthermore, usingan area of the capacitance detecting electrode of S_(D) (μm²), athickness of the capacitance detecting dielectric layer of t_(D) (μm),and a dielectric constant of the signal detection element of ∈_(D), theelement capacitance C_(D) of the signal detection element is defined asC _(D)=∈₀·∈_(D) ·S _(D) /t _(D)

where ∈₀ is the permittivity in vacuum. The surface of object becomes aground electrode for the element capacitance C_(D), and the capacitancedetecting electrode is equivalent to the other electrode by interposingthe capacitance detecting dielectric layer. Because the capacitancedetecting electrode is connected to the gate electrode of the MIS typethin film semiconductor device for signal amplification and thereference capacitor second electrode, a capacitor having the elementcapacitance C_(D) and a capacitor having the transistor capacitanceC_(T) are coupled in series, and at the same time, the capacitor havingthe element capacitance C_(D) and a capacitor having the capacitanceC_(R) of the reference capacitor are coupled in series. A voltage V_(dd)is applied to the two capacitors coupled in series (FIG. 5(A)). Becausethe applied voltage is divided depending on the electrostaticcapacitance, a voltage V_(GT), which is applied on the gate electrode ofthe MIS type thin film semiconductor device for signal amplification inthis state, becomes as follows;$V_{GT} = \frac{V_{dd}}{1 + \frac{C_{D}}{( {C_{R} + C_{T}} )}}$

Therefore, when the element capacitance C_(D) is sufficiently largerthan C_(R)+C_(T), a summation of the capacitance C_(R) of the referencecapacitor and the transistor capacitance C_(T),C _(D)>>(C _(R) +C _(T))

the gate voltage is approximated asV_(GT)≈0

and the voltage is rarely applied to the gate electrode.

As a result, the MIS type thin film semiconductor device for signalamplification is in OFF state, and the current I becomes very small.After all, in order that the signal amplification element rarely flowscurrent when a protrusion portion of the object corresponding to a ridgeof a fingerprint contacts the electrostatic capacitance detectiondevice, it is necessary to adjust a gate electrode area, a gateelectrode length, a width of the gate electrode, a material of the gateinsulating layer, a thickness of the gate insulating layer, an area ofthe reference capacitor electrode, a length of the reference capacitorelectrode, a width of the reference capacitor electrode, a material ofthe reference capacitor dielectric layer, a thickness of the referencecapacitor dielectric layer, an area of capacitance detecting electrode,a material of the capacitance detecting dielectric layer and a thicknessof the capacitance detecting dielectric layer or the like, which formthe electrostatic capacitance detection device, so that the elementcapacitance C_(D) is sufficiently larger than C_(R)+C_(T), a summationof the capacitance C_(R) of the reference capacitor and the transistorcapacitance C_(T). Sufficiently large generally means a difference ofapproximately ten times. In other words, it is satisfactory when theelement capacitance C_(D) satisfies a relation ofC _(D)>10×(C _(R) +C _(T)),

whereas C_(R)+C_(T) is a summation of the capacitance C_(R) of thereference capacitor and the transistor capacitance C_(T). In this case,a ratio of V_(GT)/V_(dd) becomes less than approximately 0.1 and thethin film semiconductor device cannot be in ON state. In order toreliably detect the protrusion portion of the object, it is importantthat the MIS type thin film semiconductor device for signalamplification is in OFF state when the protrusion portion of the objectcontacts the electrostatic capacitance detection device. Therefore, whena positive power supply is used for the power supply voltage V_(dd), anenhancement type (normally off type) N type transistor, in which a draincurrent does not flow when the gate voltage is nearly zero, ispreferably used as the MIS type thin film semiconductor device forsignal amplification. More ideally, an N type MIS type thin filmsemiconductor device for signal amplification, which satisfies arelation of${0 < {0.1 \times V_{dd}} < V_{\min}},{0 < \frac{V_{dd}}{1 + \frac{C_{D}}{( {C_{R} + C_{T}} )}} < V_{\min}}$

whereas the V_(min) is a gate voltage (minimum gate voltage), at whichthe drain current in transfer characteristic becomes the minimum, isused.

On the other hand, when a negative power supply is used for the powersupply voltage V_(dd), an enhancement type (normally off type) P typetransistor, in which a drain current does not flow when the gate voltageis nearly zero, is used as the MIS type thin film semiconductor devicefor signal amplification. Ideally, a P type MIS type thin filmsemiconductor device for signal amplification, which satisfies arelation of${V_{\min} < {0.1 \times V_{dd}} < 0},{V_{\min} < \frac{V_{dd}}{1 + \frac{C_{D}}{( {C_{R} + C_{T}} )}} < 0}$

whereas the V_(min) is a minimum gate voltage of the P type MIS typethin film semiconductor device for signal amplification, is used.

This allows the protrusion portion of object to be reliably detected ina state that the current I is in very small.

Next, assume a situation that the object does not contact thecapacitance detecting dielectric layer and is apart from the capacitancedetecting dielectric layer with an object distance of t_(A). In otherwords, a protrusion portion of the to-be-measured object is above thecapacitance detecting dielectric layer, and the object is electricallygrounded. Specifically, when the electrostatic capacitance detectiondevice is used as a fingerprint sensor, assume detecting a state that avalley of a fingerprint is above the surface of the electrostaticcapacitance detection device. As described above, it is preferable forthe electrostatic capacitance detection device according to the presentinvention that the capacitance detecting dielectric layer is located atthe uppermost surface of the electrostatic capacitance detection device.FIG. 5(B) shows an equivalent circuit diagram at this time. Because thesurface of the object does not contact the capacitance detectingdielectric layer, a new capacitor, using air as a dielectric substance,is formed between the capacitance detecting dielectric layer and thesurface of the object. This is called as the capacitance C_(A) of theobject, defined asC _(A)=∈₀·∈_(A) ·S _(D) /t _(A),

using the permittivity in vacuum of ∈₀, a dielectric constant of air of∈_(A), and an area of capacitance detecting electrode of S_(D). Thus, inthe state that the object is apart from the capacitance detectingdielectric layer, the transistor capacitance C_(T) and the capacitanceC_(R) of the reference capacitor are coupled in parallel, the capacitorshaving the capacitance of (C_(R)+C_(T)), the element capacitance C_(D),and the capacitance C_(A) of the object are coupled in series, and thevoltage V_(dd) is applied on the capacitors (FIG. 5B). Because theapplied voltage is divided into these capacitors depending on theelectrostatic capacities, a voltage V_(GV), which is applied on the gateelectrode of the MIS type thin film semiconductor device for signalamplification in this state becomes as follows.$V_{GV} = \frac{V_{dd}}{1 + {\frac{1}{( {C_{R} + C_{T}} )} \cdot ( \frac{1}{\frac{1}{C_{D}} + \frac{1}{C_{A}}} )}}$

On the other hand, in the present invention, each of the electrostaticcapacitance detection elements is made so as to satisfy the condition ofC _(D)>>(C _(R) +C _(T))

so that the drain current becomes significantly small when the objectcontacts the electrostatic capacitance detection device. Therefore, theV_(GV) is further approximated to$V_{GV} \approx {\frac{V_{dd}}{1 + \frac{C_{A}}{( {C_{R} + C_{T}} )}}.}$

After all, when C_(R)+C_(T), a summation of the capacitance C_(R) of thereference capacitor and the transistor capacitance C_(T), issufficiently larger than the capacitance C_(A) of the object,(C _(R) +C _(T))>>C _(A)

the gate voltage V_(GV) is as followsV_(GV)≈V_(dd)

and can be substantially equal to the power supply voltage V_(dd).

As a result, the MIS type thin film semiconductor device for signalamplification can be in ON state, and the current I becomessignificantly large. In order that the signal amplification elementflows a large current when a recessed portion of the objectcorresponding to a valley of a fingerprint is above the electrostaticcapacitance detection device, it is necessary to configure an gateelectrode area, a gate electrode length, a width of the gate electrode,a material of the gate insulating layer, a thickness of the gateinsulating layer, an area of the reference capacitor electrode, a lengthof the reference capacitor electrode, a width of the reference capacitorelectrode, a material of the reference capacitor dielectric layer, athickness of the reference capacitor dielectric layer, an area of thecapacitance detecting electrode, a material of the capacitance detectingdielectric layer, and a thickness of the capacitance detectingdielectric layer, or the like, which form the electrostatic capacitancedetection device, so that C_(R)+C_(T), a summation of the capacitanceC_(R) of the reference capacitor and the transistor capacitance C_(T) issufficiently larger than the capacitance C_(A) of the object. Asdescribed above, sufficiently large means a difference of approximatelyten times, therefore, it is satisfactory when C_(R)+C_(T), a summationof the capacitance C_(R) of the reference capacitor and the transistorcapacitance C_(T), and the capacitance C_(A) of the object satisfy arelation of(C _(R) +C _(T))>10×C _(A).

In this case, a ratio of V_(GT)/V_(dd) becomes larger than approximately0.91, and the semiconductor device can be easily in ON state. Toreliably detect the recessed portion of the object, it is important thatthe MIS type thin film semiconductor device for signal amplificationbecomes ON state when the recessed portion of the object approaches tothe electrostatic capacitance detection device. When a positive powersupply is used for the power supply voltage V_(dd), an enhancement type(normally off type) N type transistor is used as the MIS type thin filmsemiconductor device for signal amplification, and the threshold voltageV_(th) of this transistor is preferably smaller than the V_(GV).$0 < V_{th} < \frac{V_{dd}}{1 + {\frac{1}{( {C_{R} + C_{T}} )} \cdot ( \frac{1}{\frac{1}{C_{D}} + \frac{1}{C_{A}}} )}}$$0 < V_{th} < \frac{V_{dd}}{1 + \frac{C_{A}}{( {C_{R} + C_{T}} )}}$

More ideally, an N type MIS type thin film semiconductor device forsignal amplification, which satisfies a relation of0<V _(th)<0.91×V _(dd),

is used. On the other hand, when a negative power supply is used for thepower supply voltage V_(dd), an enhancement type (normally off type) Ptype transistor is used as the MIS type thin film semiconductor devicefor signal amplification, and ideally, the threshold voltage V_(th) ofthe P type MIS type thin film semiconductor device for signalamplification is preferably larger than the V_(GV). More ideally, an Ntype MIS type thin film semiconductor device for signal amplification,which satisfies a relation of$\frac{V_{dd}}{1 + {\frac{1}{( {C_{R} + C_{T}} )} \cdot ( \frac{1}{\frac{1}{C_{D}} + \frac{1}{C_{A}}} )}} < V_{th} < 0$${\frac{V_{dd}}{1 + \frac{C_{A}}{( {C_{R} + C_{T}} )}} < V_{th} < 0},$

is used. On the other hand, when a negative power supply is used for thepower supply voltage V_(dd), an enhancement type (normally off type) Ptype transistor is used as the MIS type thin film semiconductor devicefor signal amplification, and ideally, the threshold voltage V_(th) ofthe P type MIS type thin film semiconductor device for signalamplification is preferably larger than the V_(GV).

More ideally, a P type MIS type thin film semiconductor device forsignal amplification, which satisfies a relation of0.91×V _(dd) <V _(th)<0,

is used. This allows the recessed portion of the object to be detectedsecurely in a state of the significant large current I.

After all, in order to accurately recognizes the indentation of theobject by rarely flowing current in the signal amplification elementwhen the protrusion portion of the object corresponding to a ridge of afingerprint or the like contacts the electrostatic capacitance detectiondevice, and at the same time, by flowing large current in the signalamplification element when the recessed portion of the objectcorresponding to a valley of a fingerprint or the like approaches theelectrostatic capacitance detection device, it is necessary for theelectrostatic capacitance detection element that the capacitancedetecting dielectric layer is located on the uppermost of theelectrostatic capacitance detection device, or to provide a conductivelayer separated for each of the electrostatic capacitance detectionelements on the capacitance detecting dielectric layer and to adjust agate electrode area of S_(T) (μm²), a gate electrode length of L_(T)(μm), and a width of the gate electrode of W_(T) (μm) of the MIS typethin film semiconductor device for signal amplification, a thickness ofthe gate insulating layer of t_(ox) (μm), a dielectric constant of thegate insulating layer of ∈_(ox), an area of the reference capacitorelectrode of S_(R) (μm²), a length of the reference capacitor electrodeof L_(R) (μm), a width of the reference capacitor electrode of W_(R)(μm), a thickness of the reference capacitor dielectric layer of t_(R)(μm), a dielectric constant of the reference capacitor dielectric layerof ∈_(R), an area of the capacitance detecting electrode of S_(D) (μm²),a thickness of the capacitance detecting dielectric layer of t_(D) (μm),a dielectric constant of the capacitance detecting dielectric layer of∈_(D) or the like so that the element capacitance C_(D) is sufficientlylarger than C_(R)+C_(T), a summation of the capacitance C_(R) of thereference capacitor and the transistor capacitance C_(T), and ideally,the electrostatic capacitance detection device is configured so thatC_(R)+C_(T), a summation of the capacitance C_(R) of the referencecapacitor and the transistor capacitance C_(T), is sufficiently largerthan the capacitance C_(A) of the object when the object is apart fromthe capacitance detecting dielectric layer with an object distance oft_(A) without contacting. More specifically, the electrostaticcapacitance detection device is configured so that the elementcapacitance C_(D), C_(R)+C_(T), a summation of the capacitance C_(R) Ofthe reference capacitor and the transistor capacitance C_(T), and thecapacitance C_(A) of the object satisfy a relation ofC _(D)>10×(C _(R) +C _(T))>100×C _(A).

Furthermore, when a positive power supply is used for the power supplyvoltage V_(dd), an enhancement type (normally off type) N typetransistor is preferably used as the MIS type thin film semiconductordevice for signal amplification, and the minimum gate voltage V_(min) ofthis N type transistor satisfies a relation of0 < 0.1 × V_(dd) < V_(min)  or$0 < \frac{V_{dd}}{1 + \frac{C_{D}}{( {C_{R} + C_{T}} )}} < V_{\min}$

And furthermore, ideally, an enhancement type N type transistor, inwhich the threshold voltage V _(th) is smaller than the V_(GV), that is,satisfying a relation of 0 < V_(th) < 0.91 × V_(dd)  or${0 < V_{th} < \frac{V_{dd}}{1 + \frac{C_{A}}{( {C_{R} + C_{T}} )}}},$

is used.

On the other hand, when a negative power supply is used for the powersupply voltage V_(dd), an enhancement type (normally off type) P typetransistor is preferably used as the MIS type thin film semiconductordevice for signal amplification, and the minimum gate voltage V_(min) ofthis P type transistor satisfies a relation ofV_(min) < 0.1 × V_(dd) < 0  or$V_{\min} < \frac{V_{dd}}{1 + \frac{C_{D}}{( {C_{R} + C_{T}} )}} < 0$

And furthermore, ideally, an enhancement type P type transistor, inwhich the threshold voltage V_(th) is larger than the V_(GV), that is,satisfying a relation of 0.91 × V_(dd) < V_(th) < 0    or${\frac{V_{dd}}{1 + {C_{A}/( {C_{R} + C_{T}} )}} < V_{th} < 0},$

is used.

Next, an overall configuration of the electrostatic detecting deviceaccording to the present invention is described with reference to FIG.6. The electrostatic capacitance detection device, which reads surfacecontours of an object, is formed of M (M is an integer one or more)individual power supply lines and N (N is an integer one or more)individual output lines, arranged in a matrix of M rows×N columns, andelectrostatic capacitance detection elements provided on the crossingpoints of the individual power supply lines and the individual outputlines. Each of the electrostatic capacitance detection elements isformed of a capacitance detecting electrode, a capacitance detectingdielectric layer, a reference capacitor and a signal amplificationelement, and detects an electrostatic capacitance, which changesaccording to the distance with the object. Because the electrostaticcapacitance detection elements are arranged in a matrix of M rows×Ncolumns, each of the columns and the rows has to be sequentially scannedand each of the M×N electrostatic capacitance detection elements has tobe selected in a proper order in order to read surface contours. Anoutput signal selecting circuit determines in what order detectedsignals are read out from each of the electrostatic capacitancedetection elements. The output signal selecting circuit is formed of acommon output line and a path gate for output signal, and selects anindividual output line from N individual output lines for outputting anoutput signal. The output signal selecting circuit operates using aclock signal supplied from a clock generator on the X side.

A circuit diagram of the clock generator is shown in FIG. 7. In orderthat the output signal selecting circuit selects an output signal to beoutputted, the output signal selecting circuit preferably is formed of ashift register, a NAND gate and a buffer (FIG. 9). The shift register isconfigured by coupling a plurality of basic stages in series, whereaseach of the basic stages is a series circuit of a flip-flop, formed of aclocked inverter and an inverter, and a clocked inverter. The outputsfrom the adjacent basic stages become the inputs to the NAND gate, andan output of the NAND gate is used as an output selecting signal afterreverse-amplifying with the buffer. The output selecting signal isoutputted to an output line for output selection, and controls anoperation of the path gate for output signal (FIG. 10).

The signal amplification element in each of the electrostaticcapacitance detection elements can be formed of a MIS type thin filmsemiconductor device for signal amplification, including a gateelectrode, a gate insulating layer and a semiconductor layer. The pathgate for output signal is formed of a MIS type thin film semiconductordevice for output signal path gate, including a gate electrode, a gateinsulating layer and a semiconductor layer. In the present invention,the source region of the MIS type thin film semiconductor device forsignal amplification is connected to each of the individual outputlines, the drain region of the MIS type thin film semiconductor devicefor signal amplification element is connected to each of the individualpower supply lines and the reference capacitor first electrode, and thegate electrode of the MIS type thin film semiconductor device for signalamplification element is connected to the capacitance detectingelectrode and the reference capacitor second electrode. (In FIG. 10, thesource region, the drain region and the gate electrode of the MIS typethin film semiconductor device are indicated by S, D and G,respectively.) Thus, each of the individual power supply lines and theindividual output lines are mutually coupled via the channel formingregion, which responds to an electric charge Q detected by thecapacitance detecting electrode.

In the invention, the source region of the MIS type thin filmsemiconductor device for output signal path gate is connected to thecommon output line, the drain region of the MIS type thin filmsemiconductor device for output signal path gate is connected to each ofthe individual output lines, and the gate electrode of the MIS type thinfilm semiconductor device for output signal path gate is connected tothe output line for output selection, which supplies a signal forselecting what individual output line from the N individual output lines(FIG. 10). As described above, each of the output lines for outputselection may be coupled to each of the output stages (reverse-amplifiedoutput of the NAND gate, which received outputs from the adjacent basicstages) of the shift register for output signal (in case of FIG. 10), ormay be coupled each of the output stages of a decoder for output signalin place of the shift register for output signal. The shift register foroutput signal sequentially supplies the selection signals, which aretransferred to the N output stages. Furthermore, the decoder for outputsignal selects a certain output stage from N output stages depending onthe input signal to the decoder. Thus, the selection signal issequentially inputted to the N path gates for output signal, asrequired, as a result, N individual output lines are electricallyconducted to the common output line sequentially.

The power supply selecting circuit selects a certain individual powersupply line from M individual power supply lines, and supplies power tothe selected individual line. Whether each of the individual powersupply lines can be selected or not depend on the presence or theabsence of the power supply (FIG. 6). The power supply selecting circuituses a clock signal supplied by a clock generator on the Y side. Acircuit diagram of the clock generator is shown in FIG. 7. In order thatthe power supply selecting circuit selects a certain individual powersupply line, the power supply selecting circuit preferably is formed ofa shift register, a NAND gate and an inverter (FIG. 8). The shiftregister is configured by coupling a plurality of basic stages inseries, whereas the basic stage is a series circuit of a flip-flop,formed of a clocked inverter and an inverter, and a clocked inverter.The outputs from the adjacent basic stages become the inputs to the NANDgate, and an output of the NAND gate is used as the power supplyselecting signal after reverse-amplifying with the inverter. The powersupply selecting signal is outputted to the each of the individual powersupply lines. When the certain individual power supply line is selectedin this way, the selected individual power supply line is conducted tothe power supply V_(dd). On the other hand, unselected individual powersupply lines have a ground potential (V_(ss)).

The power selection circuit may be coupled to each of the output stages(reverse-amplified output of the NAND gate, which received outputs fromthe adjacent basic stages) of the shift register, or may be coupled toeach of the output stages of the decoder for power supply selection inplace of the shift register shown in FIG. 8. The shift register forpower supply selection sequentially supplies the selection signals,which are transferred to the M output stages. Furthermore, the decoderfor power supply selection selects a certain output stage from M outputstages depending on the input signal to the decoder. Thus, M individualpower supply lines are conducted to the power supply (V_(dd))sequentially or as required.

In order that the electrostatic capacitance detection device functionsin this configuration, the individual output lines and the common outputline are wired by the first wiring, the individual power supply linesand the output lines for output selection are wired by the secondwiring, and the capacitance detecting electrode are wired by the thirdwiring. And the first, second, and third wirings have to be electricallyinsulated via the insulating layers. This configuration eliminatesredundant wirings, thereby minimizes the parasitic capacitance generatedbetween wirings, and detecting a small amount of electrostaticcapacitance with high sensitivity.

Such an electrostatic capacitance detection element can be formed on aplastic substrate by using the above-described SUFTLA technology. Afingerprint sensor on a plastic substrate using the single crystalsilicon technology is lack of practicability because it cracks in shortperiod, and has an insufficient size. On the other hand, theelectrostatic capacitance detection element on a plastic substrateaccording to the present invention can be used as a fingerprint sensoron a plastic substrate because there is no concern that it cracks evenwhen the area is large enough to cover a finger on the plasticsubstrate. Specifically, the present invention realizes a smart cardwith a function of the personal authentication. The smart card with afunction of the personal authentication can be used for a cash card(bank card), a credit card and an identification card (ID card), andremarkably improves security level for these cards, and has an excellentfunction of protecting the personal fingerprint information withoutleaking out of the card.

An electrostatic capacitance detection device, formed of a thin filmsemiconductor device, is manufactured on a glass substrate, and theelectrostatic capacitance detection device is transferred onto a plasticsubstrate by using the SUFTLA technology, and then the electrostaticcapacitance detection device is manufactured on the plastic substrate.The electrostatic capacitance detection device is formed ofelectrostatic capacitance detection elements, arranged in a matrix of300 columns×300 rows. The matrix is a square of 20.32 mm in each side.

The substrate is made of polyethersulfone (PES) with a thickness of 400μm. Each of the MIS type thin film semiconductor device for signalamplification, the MIS type thin film semiconductor device for outputsignal path gate, the MIS type thin film semiconductor device formingthe selection circuit for output signal, the MIS type thin filmsemiconductor device forming the power supply selecting circuit is madeof a thin layer transistor. Except for the MIS type thin filmsemiconductor device for signal amplification, the each thin layertransistor has a same cross-sectional structure, and an NMOS transistoris formed of a so-called lightly doped drain (LDD) structure thin layertransistor, and a PMOS transistor is formed the thin layer transistor ofa self-aligned structure. The thin layer transistor forming the MIS typethin film semiconductor device for signal amplification is of a top gatetype as shown in FIG. 4, whereas the source electrode side is of aself-aligned structure (the gate electrode end and the source region endare substantially matched), and the drain electrode side is of anon-self aligned structure (the gate electrode and the drain region havean overlapped portion). Because the drain electrode side is of thenon-aligned structure, this portion becomes a reference capacitor. Inother words, the signal amplification element and the referencecapacitor are integrally formed.

The thin film semiconductor device can be made in a low temperatureprocess, in which the maximum temperature is 425° C. The semiconductorlayer is a polycrystal silicon thin layer obtained by the lasercrystallizing method, having a thickness of 59 nm. And, the gateinsulating layer is a silicon oxide layer having a thickness of 45 nmformed by the chemical vapor deposition method (CVD method), and thegate electrode is made of tantalum thin layer having a thickness of 400nm. The dielectric constant of the silicon oxide layer forming the gateinsulating layer is determined as approximately 3.9 by the CVmeasurement. The first interlayer insulating layer and the secondinterlayer insulating layer can be silicon oxide layer formed by the CVDmethod using tetraethylorthosilicate (TEOS: Si (OCH₂CH₃)₄) and oxygen asmaterials. It is preferable that the first interlayer insulating layeris approximately 20% or more thicker than the gate electrode (400 nm forthe embodiment), and thinner than the second interlayer insulatinglayer. This is because the gate electrodes can be securely covered and ashort-circuit between the gate electrode and the first wiring or thesecond wiring can be prevented, and at the same time, the secondinterlayer insulating layer can be thickened. In the embodiment, thefirst interlayer insulating layer has a thickness of 500 nm.

The third interlayer insulating layer insulates the second wiring andthe capacitance detecting electrode and prevents a short-circuit. Thefirst wiring and the capacitance detecting electrode are insulated bythe second interlayer insulating layer and the third insulating layer.Therefore, in order to minimize the parasitic capacitance generatedbetween the first wiring and the capacitance detecting electrode, and torealize the electrostatic capacitance detection device with highsensitivity, it is preferable that the dielectric constant of the secondinterlayer insulating layer and the third interlayer insulating layerare as small as possible and their thickness are as thick as possible.However, when the total thickness of the silicon oxide deposited by theCVD method exceeds approximately 2 μm, the silicon oxide layer may becracked and the yield may be lowered. Accordingly, a total thickness ofthe first interlayer insulating layer, the second interlayer insulatinglayer and the third interlayer insulating layer is set to approximately2 μm or less. This increases the productivity of the electrostaticcapacitance detection device.

As described above, because the second interlayer insulating layer andthe third interlayer insulating layer are preferably thicker, they aremade thicker than the first interlayer insulating layer. Ideally, thefirst interlayer insulating layer is approximately 20% or more thickerthan the gate electrode, the second interlayer insulating layer and thethird interlayer layer are thicker than the first interlayer insulatinglayer, and the total thickness of the first interlayer insulating layer,the second interlayer insulating layer the third interlayer layer isapproximately 2 μm or less. In the embodiment, the second interlayerinsulating layer has a thickness of 1 μm. The first wiring and thesecond wiring are made of aluminum having a thickness of 500 nm, and awidth of the wiring is 5 μm. The common output line and the individualoutput lines are formed by the first wiring, and the individual powersupply lines, the output lines for output selection, and the capacitancedetecting electrode is formed by the second wiring. The gap between eachof the individual power supply lines and the capacitance detectingelectrode is 5 μm, and the gap between each of the individual outputlines and the capacitance detecting electrode is also 5 μm.

In the embodiment, the pitch of the matrix forming the electrostaticcapacitance detection device is 66.7 μm, and the resolution is set to381 dpi (dots per inch). Accordingly, the capacitance detectingelectrode has a size of 55.0 μm×55.0 μm. The capacitance detectingdielectric layer is formed by a silicon nitride layer having a thicknessof 350 nm. The dielectric constant of the silicon nitride layer isapproximately 7.5 by the CV measurement, therefore, the elementcapacitance C_(D) becomes approximately 574 fF (femtoFarad). When theelectrostatic capacitance detection device is supposed to be afingerprint sensor, the capacitance C_(A) of the object is calculated tobe 0.54 fF when a valley of a fingerprint is above the surface of theelectrostatic capacitance detection device because the indentation ofthe fingerprint is approximately 50 μm. On the other hand, the electrodelength of the MIS type thin film semiconductor device for signalamplification is set to 7 μm, in which a length of the referencecapacitor part (L₁) is 4.5 μm, and a length of the transistor part(length of the channel forming L₂) is 2.5 μm. Because a width of thegate electrode is 10 μm, a summation of the transistor capacitance C_(T)and the capacitance C_(R) of the reference capacitor becomesapproximately 53.7 fF. Thus, the electrostatic capacitance detectionelement in the embodiment satisfies a relation ofC _(D)>10×(C _(R) +C _(T))>100×C _(A).

Accordingly, when the power supply voltage V_(dd) is set to 3.3 V, theV_(GT) applied on the gate electrode of the MIS type thin filmsemiconductor device for signal amplification becomes 0.16 V when aridge of a fingerprint contacts the surface of the electrostaticcapacitance detection device, and the voltage V_(GV) applied on the gateelectrode becomes 3.22 V when a valley of a fingerprint is above thesurface of the electrostatic capacitance detection device.

FIG. 11 shows a transfer characteristic of the MIS type thin filmsemiconductor device used in the embodiment. The shift register foroutput signal is of a CMOS structure, and each of the MIS type thin filmsemiconductor device for signal amplification and the MIS type thin filmsemiconductor device for output signal path gate is formed by an NMOStransistor. The minimum gate voltage V_(min) of the MIS type thin filmsemiconductor device for signal amplification is 0.1 V, which does notsatisfy a relation of0<0.1×V _(dd) <V _(min),

however, the drain current is made smaller than 1 pA (10⁻¹² A) withV_(GT)=0.16, thereby, detecting the ridge of a fingerprint with ease. Onthe other hand, the threshold voltage V_(th) is 1.47 V, which satisfiesa relation of0<V _(th)<0.91×V _(dd)=3.00 V.

As a result, when a ridge of a fingerprint contacts the surface of theelectrostatic capacitance detection device, the current value outputtedfrom the signal amplification element becomes 5.6×10⁻¹³ A, which issignificantly small. On the other hand, when a valley of a fingerprintis above the surface, a large current of 2.4×10⁻⁵ A is outputted fromthe signal amplification element, thereby, the indentation informationsuch as a fingerprint can be detected with high precision.

While the invention has been described in conjunction with specificembodiments thereof, it is evident that many alternatives, modificationsand variations will be apparent to those skilled in the art.Accordingly, preferred embodiments of the invention as set forth hereinare intended to be illustrative, not limiting. There are changes thatmay be made without departing from the spirit and scope of theinvention.

1. An electrostatic capacitance detection device for reading surfacecontours of an object by detecting an electrostatic capacitance, whichchanges according to a distance with the object, comprising: Mindividual power supply lines and N individual output lines, arranged ina matrix of M rows×N columns, and electrostatic capacitance detectionelements provided on crossing points of the individual power supplylines and the individual output lines; a drain region of the MIS typethin film semiconductor device for signal amplification beingelectrically coupled to the individual power supply lines and thereference capacitor first electrode, and a gate electrode of the MIStype thin film semiconductor device for signal amplification beingcoupled to the capacitance detecting electrode and the referencecapacitor second electrode, each of the electrostatic capacitancedetection elements being formed of a signal detection element and asignal amplification element, the signal detection element being formedof a capacitance detecting electrode, a capacitance detecting dielectriclayer and a reference capacitor, the reference capacitor being formed ofa reference capacitor first electrode, a reference capacitor dielectriclayer and a reference capacitor second electrode, and the signalamplification element being formed of a MIS type thin film semiconductordevice for signal amplification, including a gate electrode, a gateinsulating layer and a semiconductor layer.
 2. The electrostaticcapacitance detection device according to claim 1, the referencecapacitor dielectric layer and the gate insulating layer of the MIS typethin film semiconductor device for signal amplification being formedwith a same material on a same layer.
 3. The electrostatic capacitancedetection device according to claim 1, the reference capacitor firstelectrode and a drain region of the semiconductor film being formed witha same material on a same layer.
 4. The electrostatic capacitancedetection device according to claim 1, the reference capacitor secondelectrode and the gate electrode being formed with a same material on asame layer.
 5. The electrostatic capacitance detection device accordingto claim 1, the capacitance detecting dielectric layer being located onan uppermost surface of the electrostatic capacitance detection device.